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1 CATS system for the SSRF
Mar 2013

1 CATS system for the SSRF

After becoming the reference solution in Europe, and after having been validated as the most reliable system by the Advanced Photon Source (Argonne, USA), the CATS has been chosen for the new Macromolecular Micro-focused Crystallography beamline at the Shanghai Synchrotron Radiation Facility.

A complete system, including the manipulation of crystallization plates, will be in operation in Shanghai by the end of 2013.

IPAC 2013
Jan 2013

IPAC 2013

IRELEC will participate to the 4th international conference for particle accelerator which will take place at the Shanghai convention centre from May 12 to 17.
> IPAC 2013 website

2 mirror systems for the ROCK beamline
Dec 2012

2 mirror systems for the ROCK beamline

IRELEC was granted a contract by SOLEIL for the supply of two mirror systems for the ROCK beamline.

IRELEC member of the cluster MINALOGIC
Nov 2012

IRELEC member of the cluster MINALOGIC

IRELEC becomes a member of the cluster MINALOGIC for micro and nanotechnologies.

SOLEIL
Sep 2012

Two CATS for SOLEIL

IRELEC was granted a contract by SOLEIL for the supply of two CATS sample changers for the Proxima 1 and Proxima 2a beam lines. SOLEIL gives IRELEC the opportunity to assert its know-how for the automation of stations using the crystallization plates and the Universal Puck standard.

contrat de licence avec l’EMBL
Aug 2012

Licence agreement with the EMBL

IRELEC signed a licence agreement with the EMBL for the production and commercialization of the SC3 baskets.

CATS test station for user’s training
Jul 2012

CATS test station for user’s training

IRELEC installs a full CATS test station in its premises for user training. Detailed information on the proposed training courses will soon be available.

SRI 2012
Jul 2012

SRI 2012

The IRELEC team looks forward to welcoming you at the SRI 2012 from July 9th to 13th 2012 at the Convention Centre in Lyon.

CEA leti
Apr 2012

A contract with CEA LETI

IRELEC signed a contract with CEA LETI for the study of contamination in advanced lithography.