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Mirror shape compensators

A reliable way to suppress mirror substrate long period slope errors​

Mirror shape compensators - IRELEC

Mirror shape compensators

A reliable way to suppress mirror substrate long period slope errors​

Mirror shape compensators - IRELEC

Following a successful collaboration experience with ALBA for two mirror systems in KB configuration for the XALOC beamline in 2010, IRELEC proposes mirror holders (applicable to flat mirrors as well as for dynamically-figured mirrors) that makes it possible to compensate the mirror substrate long-period slope error by using calibrated and accurate push-and-pull actuators placed in specific positions along the mirror.

This device is particularly intended to minimize the beam spot striation effect at the sample position when operating the beamline in a defocused mode (for instance, when the sample is set out of the focus so that the beam size matches the sample size).

It is adaptable to flat and bent mirrors of any mirror length (classically between 200 mm and 1.5 m).

It was successfully implemented on 4 bent mirrors for the CoSAXS beamline at MAX IV, allowing to achieve sub-nanometer shape errors on 0.5 m long silicon mirrors.

Specifications

Mirror shape correction

< 1 nm rms

Control

Manual or motorized

Optical configuration

Horizontal and vertical focusing mirrors

Correction stability

Better than ± 0.1 nm rms over 5 years
Measured value on operated beamline

UHV compliant

References

Publications

J. Juanhuix et al. J. Synchrotron Rad. (2014), 21, 679-689.
Developments in optics and performance at BL13-XALOC, the macromolecular crystallography beamline at the Alba Synchrotron
T. Plivelic at al. AIP Conference Proceedings 2054, 030013 (2019),
X-ray tracing, design and construction of an optimized optics scheme for CoSAXS, the small angle x-ray scattering beamline at MAX IV laboratory

Other related Products

Complete mirror systems

  • White beam cooled M1 mirrors
  • Switch mirror systems
  • Harmonic Rejection Mirrors

Compact KB systems

  • Focal distance < 150 mm
  • Nano-focusing capabilities
  • UHV compliant

Custom KB systems

  • Variable mirror length up to 1.5 m
  • Designed to match the beamline optical layout
  • UHV compliant

Mechanical benders

  • Elliptical profiles < 100 nrad rms
  • Absolute bending encoders
  • Anti-twist configuration